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Our Thin Film Metrology- and Plasma-Control Systems are very compact, precise, modular and flexible bench top systems.


Plasma Monitoring
The PlasCalc-2000 Plasma Monitoring and Process Control System is based on optical UV/VIS/NIR emissions-spectroscopy.
The system can be programmed for all individual requirements.
  Ellipsometry
The SpecEl-2000 spectroscopic ellipsometer works in the visible spectral range and is one of the most compact, easy-to-use and cost-efficient systems to measure not only multiple layer stacks but also optical properties such as refractive index and absorption.

Reflectometry
The fiber optical reflectometer NanoCalc-2000 operates in the UV/VIS/NIR spectral range and measures up to three layer thicknesses of transparent and semi-transparent layers from 10nm up to several hundred microns. The flexible fiber-optics sensor head allows almost any adaptation.