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Applications:

In general the NanoCalc-2000 system can measure all layer thickness of transparent and semi-transparent layers on a defined substrate as long as we do get a interference signal caused by the reflection of light on the layer surface and bottom.

Here are some application which were measured successfully using the
NanoCalc-2000 system:

-  Measurement of dielectric layers on wafer or glass
   (SiO2, Si3N4, Photo-resist, ITO, ...)
-  Extremely thin metal layers on wafer or glass (Ag, Al, Au, Ti, ...)
-  SOI silicon thickness measurement (Silicon On Isolator)
-  Thickness of thinned silicon wafer  (< 120µm)
-  Resist homogeneity check on semiconductor masks
-  DVD/CD coating
-  Coatings on lenses (Hard- and Antireflection-Coating)
-  DLC (Diamond Like Carbon) hard-coatings
-  Thickness measurement of different foils
-  Air-gap measurement between mask and wafer in mask aligners
-  extremely thick resists in MEMS application (100µm up to 250µm)
-  Coating in bottles and injection syringe
-  Integration into existing coating and etch systems for on-line process control
-  And many, many more ...

Please let us know your specific application. A feasibility test measurement can be done without any charge.






3D-Result of 
SOI-Wafer Measurement